NOC:Fundamentals of Micro and Nanofabrication (USB)

Media Storage Type : 32 GB USB Stick

NPTEL Subject Matter Expert : Prof. Shankar Selvaraja

NPTEL Co-ordinating Institute : IISc Bangalore

NPTEL Lecture Count : 61

NPTEL Course Size : 14 GB

NPTEL PDF Text Transcription : Available and Included

NPTEL Subtitle Transcription : Available and Included (SRT)

Lecture Titles:

Lecture 1 - Introduction
Lecture 2 - Substrate
Lecture 3 - Substrate (Continued...)
Lecture 4 - Introduction to cleanroom
Lecture 5 - Contamination and surface cleaning
Lecture 6 - Advanced cleaning techniques
Lecture 7 - Defects
Lecture 8 - Diffusion
Lecture 9 - Diffusion - Advanced Concepts
Lecture 10 - Ion Implantation
Lecture 11 - Ion Implantation (Continued...)
Lecture 12 - Native Films
Lecture 13 - Native Films: Advanced Concepts
Lecture 14 - Native Films: Defects at Si/SiO2 interface
Lecture 15 - Methods and Some Definitions
Lecture 16 - Chemical Vapor Depostion: Basics
Lecture 17 - Chemical Vapor Depostion: Precursor Transport
Lecture 18 - Chemical Vapor Depostion: Types of CVD Equipment
Lecture 19 - Chemical Vapor Depostion: Nucleation and Growth
Lecture 20 - Chemical Vapor Depostion: Other Details
Lecture 21 - Atomic Layer Depostion
Lecture 22 - Atomic Layer Depostion (Continued...)
Lecture 23 - Physical Vapor Deposition: Basics
Lecture 24 - Physical Vapor Deposition: Evaporation
Lecture 25 - Physical Vapor Deposition: Sputtering
Lecture 26 - Mettalization: Contact resistance
Lecture 27 - Mettalization: Electromigration and Epilogue
Lecture 28 - Pattern Transfer Bascis
Lecture 29 - Optical lithography basics: resist process - 1
Lecture 30 - Optical lithography basics: resist process - 2
Lecture 31 - Optical Lithography: Contact and Proximity printing
Lecture 32 - Optical Lithography: Stepper and Scanner
Lecture 33 - Projection Lithography: Image formation basics
Lecture 34 - Projection Lithography: Image formation in photoresist
Lecture 35 - Optical lithography: Surface Reflection
Lecture 36 - Optical Lithography: Mask Technology
Lecture 37 - Lithography process technology glossary
Lecture 38 - Optical Lithography: Resolution enhancement
Lecture 39 - Electron beam lithography: Basics
Lecture 40 - Electron beam lithography: Resist process
Lecture 41 - Emerging lithography techniques
Lecture 42 - Etching Figures of Merit
Lecture 43 - Wet etching Basics
Lecture 44 - Wet Ething Recipes
Lecture 45 - Wet Ething Recipes
Lecture 46 - Dry etch: Plasma Basics
Lecture 47 - Dry etch: Plasma etching basics
Lecture 48 - Dry etch: Plasma tool configuration
Lecture 49 - Dry etch: Etch mechanism
Lecture 50 - Dry etch: Etch chemistry
Lecture 51 - Chemical Mechanical Polishing (CMP): Basics
Lecture 52 - Chemical Mechanical Polishing (CMP): Tool and process
Lecture 53 - Design for Manufacturability - 1
Lecture 54 - Design for Manufacturability - 2
Lecture 55 - Design for Manufacturability: Case study
Lecture 56 - Process integration
Lecture 57 - PV integration
Lecture 58 - CMOS integration
Lecture 59 - Lab demo: Silicon Nitride cantilever fabrication - 1
Lecture 60 - Lab demo: Silicon Nitride cantilever fabrication - 2
Lecture 61 - CMOS process for photonics application